Enhancing Stability and Performance in Tin-Based Perovskite Field-Effect Transistors Through Hydrogen Bond Suppression of Organic Cation Migration.
basic_science · Level V
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- Record sourced from PubMed, PMID 38532710.
- Also identified by DOI 10.1002/adma.202313461.
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Abstract
Ion migration poses a substantial challenge in perovskite transistors, exerting detrimental effects on hysteresis and operational stability. This study focuses on elucidating the influence of ion migration on the performance of tin-based perovskite field-effect transistors (FETs). It is revealed that the high background carrier density in FASnI<sub>3</sub> FETs arises not only from the oxidation of Sn<sup>2+</sup> but also from the migration of FA<sup>+</sup> ions. The formation of hydrogen bonding between FA<sup>+</sup> and F<sup>-</sup> ions efficiently inhibits ion migration, leading to a reduction in background carrier density and an improvement in the operational stability of the transistors. The strategy of hydrogen bond is extended to fluorine-substituted additives to improve device performance. The incorporation of 4-fluorophenethylammonium iodide additives into FETs significantly minimizes the shift of turn-on voltage during cyclic measurements. Notably, an effective mobility of up to 30 cm<sup>2</sup> V<sup>-1</sup> s<sup>-1</sup> with an I<sub>on/off</sub> ratio of 10<sup>7</sup> is achieved. These findings hold promising potential for advancing tin-based perovskite technology in the field of electronics.