Ultrahigh Néel Temperature Antiferromagnetism and Ultrafast Laser-Controlled Demagnetization in a Dirac Nodal Line MoB<sub>3</sub> Monolayer.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 39171642.
- Also identified by DOI 10.1021/acs.nanolett.4c02914 and PMC identifier 11378283.
- Licence recorded as CC BY-NC-ND.
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Abstract
Two-dimensional (2D) antiferromagnetic (AFM) materials boasting a high Néel temperature (<i>T</i><sub>N</sub>), high carrier mobility, and fast spin response under an external field are in great demand for efficient spintronics. Herein, we theoretically present the MoB<sub>3</sub> monolayer as an ideal 2D platform for AFM spintronics. The AFM MoB<sub>3</sub> monolayer features a symmetry-protected, 4-fold degenerate Dirac nodal line (DNL) at the Fermi level. It demonstrates a high magnetic anisotropy energy of 865 μeV/Mo and an ultrahigh <i>T</i><sub>N</sub> of 1050 K, one of the highest recorded for 2D AFMs. Importantly, we reveal the ultrafast demagnetization of AFM MoB<sub>3</sub> under laser irradiation, which induces a rapid transition from a DNL semimetallic state to a metallic state on the time scale of hundreds of femtoseconds. This work presents an effective method for designing advanced spintronics using 2D high-temperature DNL semimetals and opens up a new idea for ultrafast modulation of magnetization in topological semimetals.