Deep-Ultraviolet AlN Metalens with Imaging and Ultrafast Laser Microfabrication Applications.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 39879353.
- Also identified by DOI 10.1021/acs.nanolett.4c05552 and PMC identifier 11869270.
- Licence recorded as CC BY.
- The licence permits redistribution, so the abstract is shown in full and the full text is available from the publisher.
Abstract
Deep-ultraviolet (DUV) light is essential for applications including fabrication, molecular research, and biomedical imaging. Compact metalenses have the potential to drive further innovation in these fields, provided they utilize a material platform that is cost-effective, durable, and scalable. In this work, we present aluminum nitride (AlN) metalenses as an efficient solution for DUV applications. These metalenses, with a thickness of only 380 nm, deliver DUV focusing and imaging capabilities close to the theoretical diffraction limit. Leveraging their robustness to intense ultrafast laser irradiation, we demonstrate successful DUV ultrafast laser direct writing of microstructures on a polymer film and silicon substrate. These results underscore the significant promise of advancing photonic technologies in this critical wavelength regime.