Island formation in heteroepitaxial growth.

Abstract

Island formation in strain-free heteroepitaxial deposition of thin films is analyzed using kinetic Monte Carlo simulations of two minimal lattice models and scaling approaches. The transition from layer-by-layer (LBL) to island (ISL) growth is driven by a weaker binding strength of the substrate, which, in the kinetic model, is equivalent to an increased diffusivity of particles on the substrate compared to particles on the film. The LBL-ISL transition region is characterized by particle fluxes between layers 1 and 2 significantly exceeding the net flux between them, which sets a quasiequilibrium condition. Deposition on top of monolayer islands weakly contributes to the second-layer nucleation, in contrast with the homoepitaxial growth case. A thermodynamic approach for compact islands with one or two layers predicts the minimum size in which the second layer is stable. When this is linked to scaling expressions for submonolayer island deposition, the dependence of the ISL-LBL transition point on the kinetic parameters qualitatively matches the simulation results, with quantitative agreement in some parameter ranges. The transition occurs in the equilibrium regime of partial wetting, and the convergence of the transition point upon reducing the deposition rate is very slow and practically unattainable in experiments.