Controllable Synthesis of Out-of-Plane Grown Bi<sub>2</sub>TeO<sub>5</sub> with High-κ and Anisotropy for High-Performance Field-Effect Transistors.
basic_science · Level V
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- Record sourced from PubMed, PMID 40340361.
- Also identified by DOI 10.1021/acs.nanolett.5c01677.
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Abstract
Two-dimensional (2D) van der Waals (vdW) dielectrics with high-κ and anisotropy are crucial for advanced field-effect transistors (FETs) and other anisotropic electronic devices. Here, we demonstrate a 2D vdW dielectric, Bi<sub>2</sub>TeO<sub>5</sub>, that uniquely combines high-κ with pronounced anisotropy. By adjusting the precursor mass during chemical vapor deposition, we can controllably synthesize Bi<sub>2</sub>TeO<sub>5</sub> with orientations ranging from in-plane to out-of-plane. As a dielectric in MoS<sub>2</sub> top-gate FETs, Bi<sub>2</sub>TeO<sub>5</sub> achieves <i>I</i><sub>on</sub>/<i>I</i><sub>off</sub> exceeding 10<sup>7</sup>, a subthreshold swing of 65.2 mV dec<sup>-1</sup>, a small hysteresis of 15 mV, and ultralow leakage current density below 10<sup>-5</sup> A cm<sup>-2</sup>, attributed to its large effective electron mass (<i>m</i>* = 27.4 <i>m</i><sub>0</sub>). The FET shows stable performance over 1000 cycles. Additionally, Bi<sub>2</sub>TeO<sub>5</sub> with in-plane anisotropy induces gate-tunable electrical anisotropic behaviors in monolayer MoS<sub>2</sub> through interface coupling. Our findings introduce a high-performance dielectric for next-generation FETs and demonstrate its potential applications in anisotropic electronics.