Plasma-Assisted Synthesis of Ni-Doped Cu-Based Catalyst Shielded by Carbon Overlayer for Ammonia Electrosynthesis.

Wang, Zhenhao; Wang, Yi-Chi; Li, Shaofeng; Yan, Zhuoyong; Jiang, Zhanhao; Qi, Jun; Du, Yadong; Zhang, Minggguo et al. · Adv Mater · 2026

basic_science · Level V

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Abstract

Plasma-enabled N<sub>2</sub> oxidation coupled with electrocatalytic NO<sub>x</sub> <sup>-</sup> reduction (pNOR-eNO<sub>x</sub> <sup>-</sup>RR) represents a highly promising approach for sustainable, scalable, and distributed NH<sub>3</sub> production under mild conditions. However, the eNO<sub>x</sub> <sup>-</sup>RR for NH<sub>3</sub> synthesis is hindered by catalyst degradation, which results in low NH<sub>3</sub> selectivity and poor stability. Here, inspired by solid-state source doping in photolithography, this work reports a rapid plasma shock strategy to build a Ni-doped Cu-based catalyst shielded by a carbon overlayer. It demonstrates long-term stability, maintaining an NH<sub>3</sub> Faradaic efficiency (FE) of 96% for 156 h at a current density of 1000 mA cm<sup>-2</sup>. More importantly, this work establishes a continuous-flow pNOR-eNO<sub>x</sub> <sup>-</sup>RR system using air and water as feedstocks, achieving an NH<sub>3</sub> yield rate of 5.36 mmol h<sup>-1</sup> cm<sup>-2</sup> with an NH<sub>3</sub> FE of 85%. In situ characterizations and theoretical calculations reveal that the carbon overlayer suppresses electrochemical surface degradation and stabilizes the coexistence of Cu<sub>2</sub>O and Cu during eNO<sub>3</sub> <sup>-</sup>RR, while Ni doping simultaneously balances the mismatch between NO<sub>3</sub> <sup>-</sup> adsorption and *H supply and accelerates both processes. This study provides a new approach for designing stable catalysts and offers insights into the pNOR-eNO<sub>x</sub> <sup>-</sup>RR system, paving the way for continuous NH<sub>3</sub> production directly from air and water under ambient conditions.