Dual-Defect Donor-Acceptor Pairing in Metal Oxide Semiconductors for Enhanced CO<sub>2</sub> Photoreduction.
basic_science · Level V
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- Record sourced from PubMed, PMID 41190870.
- Also identified by DOI 10.1021/acs.nanolett.5c04671.
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Abstract
Defect engineering has emerged as a powerful approach to enhance the photocatalytic activity of metal oxides, yet the role of oxygen vacancies, commonly regarded as the Shockley-Read-Hall charge recombination centers, remains controversial. Taking bismuth oxybromide (BiOBr) as a prototypical photocatalyst, we demonstrate a dual-defect strategy incorporating both surface Br (V<sub>Br</sub>) and bulk O (V<sub>O</sub>) vacancies to suppress recombination and enhance CO<sub>2</sub> reduction. While the V<sub>O</sub> alone results in significant charge losses, the V<sub>Br</sub> improves CO<sub>2</sub> adsorption and lowers its LUMO to effectively capture photoexcited electrons from the V<sub>O</sub>-induced defect state for the subsequent reaction. Formation of a donor-acceptor pair between the CO<sub>2</sub> LUMO and the valence band maximum facilitates long-lived charge separation due to weak nonadiabatic coupling. The strategy extends to vacancy-transition metal doping, further lowering reaction barriers and advancing defect engineering principles. The study provides a comprehensive understanding of defect-dependent photocatalytic reactions, forming a basis for defect engineering in photocatalysis.