Flexoelectricity-driven giant polarization in (Bi, Na)TiO<sub>3</sub>-based ferroelectric thin films.

Sun, Yunlong; Niu, Ranming; Song, Zizheng; Tang, Shiyu; Wang, Huizhong; Geng, Xun; Zhang, Ji; Yang, Jack et al. · Nat Commun · 2025

basic_science · Level V

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Abstract

This study demonstrates the use of oxygen vacancy-induced planar defects to significantly enhance electrical polarization through a local flexoelectric effect. By introducing an appropriate level of aliovalent dopants, numerous local planar defects are induced in (Bi<sub>0.5</sub>, Na<sub>0.5</sub>)TiO<sub>3</sub>-based thin films. These defects, identified as oxygen-deficient structures through direct visualization of oxygen atoms and oxygen vacancies using integrated differential phase-contrast microscopy, result in the formation of head-to-head domain structures. Geometric phase analysis confirms that these structures exhibit a substantial local strain gradient of up to 10<sup>9 </sup>m<sup>-1</sup>, contributing significantly to the flexoelectric polarization. Consequently, a giant maximum polarization (P<sub>m</sub>) of 161 μC cm<sup>-2</sup> under 750 kV cm<sup>-1</sup> and a remanent polarization P<sub>r</sub> = 115 μC cm<sup>-2</sup> along with a coercive field of 250 kV cm<sup>-1</sup> are achieved, allowing these (Bi<sub>0.5</sub>, Na<sub>0.5</sub>)TiO<sub>3</sub>-based thin films to be used in low-power electronic applications. Crucially, the P<sub>m</sub> and P<sub>r</sub> of the thin films can be sustained at 133 and 98 μC cm<sup>-2</sup>, respectively, at 230 °C. Additionally, they exhibit exceptional high-temperature fatigue endurance, with P<sub>m</sub> and P<sub>r</sub> demonstrating a negligible reduction of less than 9% after 10<sup>7</sup> cycles under 750 kV cm<sup>-1</sup> at 230 °C. These values surpass those previously reported for oxide perovskite thin films at elevated temperatures, demonstrating potential applications of our thin films in high-temperature environments. Our findings offer promising avenues for advancing the application fields of ferroelectric thin films.