Epitaxial n-ZnO/MoS<sub>2</sub>/p-GaN Heterostructure Light-Emitting Diodes.
basic_science · Level V
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- Record sourced from PubMed, PMID 42012984.
- Also identified by DOI 10.1021/acs.nanolett.5c06430 and PMC identifier 13195642.
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Abstract
We investigated an epitaxial strategy for fabricating MoS<sub>2</sub> light-emitting diodes (LEDs). A full-coverage MoS<sub>2</sub> active layer was grown on p-type GaN, and n-type ZnO nanorods were then vertically aligned on the MoS<sub>2</sub> to form a p-n junction with negligible damage to the MoS<sub>2</sub>. All materials have nearly matched hexagonal structures, enabling single-crystal alignment. Although the continuous MoS<sub>2</sub> film formed multiple layers (MLs), the ZnO/MoS<sub>2</sub>/GaN heterostructure yielded favorable optical characteristics of the ML-MoS<sub>2</sub>, including internal quantum efficiency comparable to that of the single-layer MoS<sub>2</sub>. The ZnO/MoS<sub>2</sub>/GaN LED exhibited stable A and B exciton emissions, which imply direct bandgap transition with spin-orbit coupling. Without mechanically exfoliated or transferred 2D films, this epitaxial approach satisfies the key requirements for fabricating 2D-based optoelectronic and quantum light sources. The strength of epitaxy, such as large-scale scalability and multiple quantum-well formation, will further advance 2D optoelectronics, making them more practical and efficient.