Polarity and anti-distortive polarons in WO<sub>3</sub> through epitaxial shear strain.
basic_science · Level V
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- Record sourced from PubMed, PMID 42443167.
- Also identified by DOI 10.1038/s41467-026-75049-x.
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Abstract
Bestowing complementary metal-oxide semiconductor-compatible binary oxides with additional functionalities is a powerful strategy toward the realization of oxide electronics. Ideal candidates are thin films which display a strong sensitivity to strain, chemical doping or nanoscale confinement. Among these, crystalline tungsten trioxide WO<sub>3</sub> exhibits exceptional structural flexibility, enabling a wide range of functionalities. Here we reveal the emergence of a polar phase in epitaxial WO<sub>3</sub> thin films. We accomplish this by imposing epitaxial shear strain, which stabilizes a low-symmetry triclinic structure that persists up to large film thicknesses and elevated temperatures. At the atomic scale, a change in the oxygen octahedral tilt pattern facilitates this symmetry lowering into a polar phase, which manifests as a periodic in-plane polarized stripe domain configuration with needle-like bifurcations at the microscale. The stripe domain walls further exhibit a strongly enhanced electrical conductivity in conjunction with a pronounced reduction of a distortive structural mode, providing experimental evidence for anti-distortive polaronic transport recently predicted in WO<sub>3</sub>.