Experimental realization of the topologically nontrivial phase in monolayer Si<sub>2</sub>Te<sub>2</sub>.
basic_science · Level V
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- Record sourced from PubMed, PMID 42728256.
- Also identified by DOI 10.1038/s41467-026-77669-9.
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Abstract
Quantum spin Hall insulators, with dissipationless edge channels protected by time-reversal symmetry, are promising for low-power and quantum devices. However, experimentally realized examples with sizable nontrivial gaps remain scarce. Monolayer Si<sub>2</sub>Te<sub>2</sub> has been theoretically predicted to host a room-temperature quantum spin Hall phase, but the absence of a bulk analog has hindered its experimental realization. Here we show that HfTe<sub>2</sub> provides an ideal van der Waals template for the epitaxial growth of strain-free monolayer Si<sub>2</sub>Te<sub>2</sub> while preserving its nontrivial topological phase. Scanning tunneling microscopy and spectroscopy reveal an intact (1×1) lattice and a bulk band gap of ~ 300 meV, consistent with first-principles calculations. Moreover, pronounced edge states extending ~ 2.0 nm from the island boundary are observed in monolayer Si<sub>2</sub>Te<sub>2</sub>, exhibiting characteristics expected for topological edge modes. Our results establish monolayer Si<sub>2</sub>Te<sub>2</sub> as a large-gap two-dimensional topological-insulator platform for topological phenomena and device concepts at elevated temperatures.